Hitachi FT150: Micro-Spot XRF Analyzer for Ultra Thin Measurements

Hitachi FT150 XRF AnalyzerAn exciting addition to the Eastern Applied Research analyzer line, Hitach High-Technologies FT150 is a high end micro-spot x-ray fluorescence coating thickness analyzer that features poly-capillary x-ray focusing optics and Vortex silicon drift detector. The system configuration provides improved x-ray detection efficiency and enables high throughput with highly precise  ultra thin film measurements and micro-spot interests.

Review: Micro XRF Introduction Presentation

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Hitachi FT150 XRF for semiconductor process controlHigh Precision Measurements at Micro-Spots: The FT150 has an irradiation spot size of 30um (FWHM: 17um) and achieves a fluorescent x-ray intensity twice that of the conventional instrument.  For typical applications, the FT150 will cut the measurement time in half to obtain precision equal to other systems.

Poly-Capillary Optics: information coming soon, contact Eastern Applied for details

Clear Sample Image: The higher resolution sapmle observation camera, with a full digital zoom, provides the clear image of the sample having several tens of micrometers in diameter at a desired observation position.

Enhanced Visibility of Measurement Spots: The large observation window and optimized configuration of components provides improved visibilaty of the measurement position when the chamber door is closed.

Variation of Application Capabilties: The Hitachi FT150 is built for process control in the semiconductor industry but offers higher performance across applications.  Common applications include:
- measuring an ultra thin film and micro-spots of electronic components
- measuring large circuit boards of up to 600mm x 600mm (FT150L configuration)
- simultaneous measurement of Sn/Ni coatings
- semiconductor wafer thickness measurements

New Graphical User Interfaces for Ease-of-Use: Operator setting of measurement methods and samples can be registered in an application icon.  Any image, such as a sample picture and an illustration of the multi-layer, can be used for icon image.  Measurement recipes can be selected quickly and efficiently.  A measurement navigational window guides users through operation procedures.


Description: FT150 Configuration (optional configurations below)
Element Range: Aluminum (13) to Uranium (92)
X-ray Source: 45kV, Mo target standard
Detector: Silicon Drift Detector (SDD)
X-ray Focusing Optics: Poly-capillary
Sample Observation: CCD Camera, 1 million pixels
Focus Adjustment: Laser focus, auto-focus
Max Sample Size: 15.7 x 11.8 x 3.9 inches (W-D-H)
Stage Travel: 15.7 x 11.8 inches (W-D)
Measurement Software: Thin Film FP (max 5 layers, 10 elements)
Thin Film Calibration Curve Method
Qualitative Analysis
Data Process: Microsoft Excel and Word
Safety: Interlocked chamber door
Power Consumption: Less than 300VA
  Optional Configurations
FT150H Configuration: W target, same chamber as above
FT150L Configuration: Mo target
Max Sample: 23.6 x 23.6 x 0.78 inches (WxDxH)
Stage Travel: 11.8 x 11.8 inches (W-D)